Updated on 2024/03/26

写真a

 
Yasuda Masaaki
 
Organization
Graduate School of Engineering Division of Physics and Electronics Associate Professor
School of Engineering Department of Physics and Electronics
Title
Associate Professor
Affiliation
Institute of Engineering
Contact information
メールアドレス
Affiliation campus
Nakamozu Campus

Position

  • Graduate School of Engineering Division of Physics and Electronics 

    Associate Professor  2022.04 - Now

  • School of Engineering Department of Physics and Electronics 

    Associate Professor  2022.04 - Now

Degree

  • 博士(工学) ( Others )

  • 工学修士 ( Others )

Research Areas

  • Nanotechnology/Materials / Nanostructural physics  / ナノ計算科学

  • Nanotechnology/Materials / Applied physical properties  / 電子ビーム応用

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electron device and electronic equipment  / 微細加工プロセス

Research subject summary

  • ナノ加工の次世代プロセスシミュレーション開発

  • 電子・固体相互作用理論

  • 電子ビーム応用(顕微鏡・評価・分析・加工)

Research Career

  • ナノインプリント成型の分子シミュレーション解析

    Individual

    2010.04 - Now 

  • 電子線リソグラフィの分子シミュレーション開発

  • 走査電子顕微鏡における像コントラストの理論解析

  • 電子ビーム励起によるナノ材料構造制御の理論解析

  • 電子ビーム誘起現象(信号放出、絶縁物帯電、照射損傷)の理論解析

Professional Memberships

  • 日本表面真空学会

    1999.01 - Now   Domestic

  • 日本顕微鏡学会

    1995.06 - Now

  • 応用物理学会

    1990.08 - Now

  • 米国顕微鏡学会

      Overseas

  • 米国真空学会

      Overseas

Committee Memberships (off-campus)

  • Microscopy誌編集委員   日本顕微鏡学会  

    2023.01 - Now 

  • 委員   応用物理学会 ナノ荷電粒子ビーム産学連携委員会  

    2021.04 - Now 

  • 学界幹事   独立行政法人 日本学術振興会 荷電粒子ビームの工業への応用第132委員会  

    2020.04 - 2021.03 

  • 学界幹事   独立行政法人 日本学術振興会 荷電粒子ビームの工業への応用第132委員会  

    2019.04 - 2020.03 

  • 委員   独立行政法人 日本学術振興会 荷電粒子ビームの工業への応用第132委員会  

    2018.04 - 2019.03 

Awards

  • Poster award

    2015.11  

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    Country:Japan

  • Best poster award

    2009.07  

  • Poster award

    2008.11  

Papers

  • Prediction of secondary electron yield for metal materials using deep learning

    Kusumi M.

    Microscopy   73 ( 1 )   31 - 36   2024.02( ISSN:20505698

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  • Development a Laparoscope Lens with Super Water-Repellent Antifouling Function using Biomimetic Materials Reviewed

    A. Sekiguchi, H. Minami, M. Yasuda, Y. Hirai

    J. Photopolym. Sci. Technol.   36 ( 3 )   173 - 182   2023.04

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    Publishing type:Research paper (scientific journal)  

  • Surface property control for 193 nm immersion resist by addition of Si compound Reviewed

    C. Tang, A. Sekiguchi, Y. Ohta, Y. Hirai, and M. Yasuda

    J. Vac. Sci. Technol. B   41 ( 1 )   012602   2023.01

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    Authorship:Last author, Corresponding author   Publishing type:Research paper (scientific journal)   International / domestic magazine:International journal  

  • Smart Systems for Material and Process Designing in Direct Nanoimprint Lithography Using Hybrid Deep Learning Reviewed

    Y. Hirai, S. Tsukamoto, H. Tanabe, K. Kameyama, H. Kawata and M. Yasuda

    Nanomaterials   12   2571   2022.07

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    Authorship:Last author   Publishing type:Research paper (scientific journal)  

  • Effects of acid diffusion and resist molecular size on line edge roughness for chemically amplified resists in EUV lithography: computational study Reviewed

    M. Koyama, K. Imai, M. Shirai, Y. Hirai and M. Yasuda

    Jpn. J. Appl. Phys. 雑誌   60 ( 10 )   2021.10

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    Kind of work:Joint Work  

  • Automatic design of the build-in lens mask for three-dimensional photo lithography Reviewed

    T. Osumi, M. Sasago, M. Yasuda, and Y. Hirai

    Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology   2021.08

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    Kind of work:Joint Work  

  • Proposal of Hybrid Deep Learning System for Process and Material Design in Thermal Nanoimprint Lithography Reviewed

    S. Tsukamoto, H. Tanabe, R. Yamamura, K. Kameyama, H. Kawata, M. Yasuda, and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   34 ( 2 )   2021.06

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    Kind of work:Joint Work  

  • Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask Reviewed

    T. Osumi, A. Misaka, K. Sato, M. Yasuda, M. Sasago, and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   34 ( 2 )   2021.06

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    Kind of work:Joint Work  

  • Stochastic Simulation of Development Process in Electron Beam Lithography Reviewed

    J. Photopolym. Sci. Technol.   34 ( 6 )   661 - 665   2021

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    Authorship:Last author, Corresponding author   Publishing type:Research paper (scientific journal)   International / domestic magazine:International journal  

  • Fabrication of Nickel Plasma Etching Mask by Nano-Imprint Lithography and Electroless Plating Reviewed

    S. Shimizu, H. Tanabe, M. Yasuda, Y. Hirai, H. Kawata

    J. Photopolym. Sci. Technol. 雑誌   33 ( 5 )   2020.07

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    Kind of work:Joint Work  

  • Stochastic Simulation of Pattern Formation for Negative-Type Chemically Amplified Resists in Extreme Ultraviolet Lithography Reviewed

    M. Yasuda, M. Koyama, K. Imai, M. Shirai, H. Kawata, and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   33 ( 1 )   2020.05

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    Kind of work:Joint Work  

  • Fabrication of Self-Standing Polystyrene Thin Films with Fine Through Holes by Use of Water Soluble Resin Sacrificial Layer Reviewed

    H. Kawata, K. Uchida, M. Yasuda, and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   32   2019.05

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    Kind of work:Joint Work  

  • Stochastic Simulation of Pattern Formation for Chemically Amplified Resist in Electron Beam Lithography Reviewed

    M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda

    Jpn. J. Appl. Phys. 雑誌   58   2019.05

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    Kind of work:Joint Work  

  • Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography Reviewed

    M. Yasuda, M. Koyama, K. Fukunari, M. Shirai, H. Kawata and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   32   2019

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    Kind of work:Joint Work  

  • Stochastic Simulation of Pattern Formation in Electron Beam Lithography Reviewed

    M. Yasuda, M. Koyama, M. Shirai, H. Kawata, and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   36 ( 6 )   2018.11

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    Kind of work:Joint Work  

  • Study on induced strain in direct nanoimprint lithography Reviewed

    K. Watanabe, T. Iida, M. Yasuda, H. Kawata and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   57 ( 6 )   2018.06

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    Kind of work:Joint Work  

  • Transfer Printing by Use of Delayed UV Cure Resin for Fabricating Multilayer Structures Reviewed

    T. Yamamoto, M. Yasuda, Y. Hirai, and H. Kawata

    J. Photopolym. Sci. Technol. 雑誌   31   2018

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    Kind of work:Joint Work  

  • Computational Study of Pattern Formation in UV Nanoimprint Lithography Reviewed

    M. Yasuda, M. Koyama, R. Sakata, M. Shirai, H. Kawata and Y. Hirai

    J. Photopolym. Sci. Technol.   31 ( 2 )   2018

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    Kind of work:Joint Work  

  • Stochastic Simulation of the UV Curing Process in Nanoimprint Lithography: Pattern Size and Shape Effects in Sub-50 nm Lithography Reviewed

    M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda

    J. Vac. Sci. Technol. B   35 ( 6 )   2017.11

  • Computational Study on UV Curing Characteristics in Nanoimprint Lithography: Stochastic Simulation Reviewed

    M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda

    Jpn. J. Appl. Phys. 雑誌   Vol.56 ( No.6S1 )   2017.06

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    Kind of work:Joint Work  

  • Multiscale Simulation of the Development Process in Electron Beam Lithography Reviewed

    M. Yasuda, S. Hitomi, H. Kawata and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   Vol.30 ( No.2 )   205 - 209   2017.06

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    Kind of work:Joint Work  

  • Impact of Template Stiffness during Peeling Release in Nanoimprint Lithography Reviewed

    F. Chalvin, N. Nakamura, T. Tochino, M. Yasuda, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.34 ( No.6 )   2016.11

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    Kind of work:Joint Work  

  • Multiphysics Simulation of Nanopatterning in Electron Beam Lithography Reviewed

    M. Yasuda, K. Tada and M. Kotera

    J. Photopolym. Sci. Technol. 雑誌   Vol.29 ( No.5 )   725 - 730   2016.06

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    Kind of work:Joint Work  

  • Study on Induced Stress and Strain in Direct Nanoimprint Lithography Reviewed

    T. Iida, M. Yasuda, H. Kawata and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   Vol.29 ( No.2 )   225 - 230   2016.06

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    Kind of work:Joint Work  

  • Impact of Wafer Deformation on Pattern Fabrication for Thermal Nanoimprint Lithography Reviewed

    H. Kawata, M. Yasuda and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   Vol.29 ( No.2 )   215 - 219   2016.06

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    Kind of work:Joint Work  

  • Three-dimensional imaging approach using built-in lens mask lithography Reviewed

    T. Tanaka, H. Kikuta, H. Kawata, M. Yasuda, M. Sasago and Y. Hirai

    Microelectron. Eng. 雑誌   Vol.158   85 - 90   2016.04

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    Kind of work:Joint Work  

  • Multiscale simulation of resist pattern shrinkage during scanning electron microscope observations Reviewed

    M. Yasuda, Y. Furukawa(学生), H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.33 ( No.6 )   2015.11

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    Kind of work:Joint Work  

  • Molecular Dynamics Study of Line Edge Roughness and the Proximity Effects in Electron Beam Lithography Reviewed

    S. Hitomi(学生), K. Michishita(学生), H. Kawata, Y. Hirai and M. Yasuda

    J. Photopolym. Sci. Technol. 雑誌   Vol.28 ( No.5 )   677 - 682   2015.11

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    Kind of work:Joint Work  

  • High Selective Plasma Etching of PMMA to PS Reviewed

    K. Shimomukai(学生), H. Kawata, M. Yasuda and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   Vol.28 ( No.4 )   569 - 572   2015.09

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    Kind of work:Joint Work  

  • Correlation between Electron-Irradiation Defects and Applied Stress in Graphene: A Molecular Dynamics Study Reviewed

    S. Kida(学生), M. Yamamoto(学生), K. Tada, H. Kawata, Hirai and M. Yasuda

    J. Vac. Sci. Technol. A 雑誌   Vol.33 ( No.5 )   2015.09

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    Kind of work:Joint Work  

  • Computational Study of the Effect of Side Wall Quality of the Template on Release Force in Nanoimprint Lithography Reviewed

    T. Tochino(学生), K. Uemura(学生), M. Michalowski, K. Fujii(学生), M. Yasuda, H. Kawata, Z. Rymuza and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.54 ( No.6S )   2015.06

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    Kind of work:Joint Work  

  • Defect Formation and Transformation in Graphene under Electron Irradiation: A Molecular Dynamics Study Reviewed

    M. Yamamoto(学生), Y. Asayama(学生), M. Yasuda, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.32 ( No.6 )   2014.11

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    Kind of work:Joint Work  

  • Computational Study of the Demolding Process in Nanoimprint Lithography Reviewed

    R. Takai(学生) M. Yasuda, T. Tochino(学生), H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.32 ( No.6 )   2014.11

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    Kind of work:Joint Work  

  • Impact of Resist Shrinkage on the Template Release Process in Nanoimprint Lithography Reviewed

    T. Tochino(学生), T. Shiotsu(学生), K. Uemura(学生), M. Yasuda, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.32 ( No.6 )   2014.11

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    Kind of work:Joint Work  

  • Fabrication of Imprint Mold with Nanotrench Patterns by Edge Lithography Reviewed

    H. Noma(学生), H. Kawata, M. Yasuda and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   Vol.27 ( No.1 )   91 - 94   2014.08

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    Kind of work:Joint Work  

  • Fabrication of Second Generation Replica Mold by Hybrid Polymer Material Ormostamp Reviewed

    H. Noma(学生), S. Wang, K. Uemura(学生), K. Shimomukai(学生), M. Yasuda, H. Kawata, H-C. Scheer and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   Vol.27 ( No.1 )   95 - 98   2014.08

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    Kind of work:Joint Work  

  • Simulation of the Template Release Process Based on Fracture Mechanics in Nanoimprint Lithography Reviewed

    T. Shiotsu(学生), K. Uemura(学生), T. Tochino(学生), S. Ooi, Y. Onishi, M. Yasuda, H. Kawata, T. Kobayashi and Y. Hirai

    Microelectron. Eng. 雑誌   Vol.123   105 - 111   2014.07

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    Kind of work:Joint Work  

  • Electron beam lithography simulation for sub-10 nm patterning Reviewed

    K. Michishita(学生), M. Yasuda, H. Kawata and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.53 ( No.6S )   2014.06

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    Kind of work:Joint Work  

  • Molecular Simulation of Pattern Formation in Electron Beam Lithography Reviewed

    M. Yasuda, H. Sakai, R. Takai, H. Kawata and Y. Hirai

    Microelectron. Eng. 雑誌   Vol.112   287 - 290   2013.12

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    Kind of work:Joint Work  

  • Correlation between Electron Irradiation Defects and Applied Stress in Carbon Nanotubes: A Molecular Dynamics Study Reviewed

    M. Yasuda, Y. Chihara(学生), K. Tada, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.31 ( No.6 )   2013.11

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    Kind of work:Joint Work  

  • Selective Edge Lithography for Fabricating Imprint Molds with Mixed Scale Patterns Reviewed

    H. Noma(学生), H. Kawata, M. Yasuda and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.31 ( No.6 )   2013.11

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    Kind of work:Joint Work  

  • Simulation Study on the Template Release Mechanism and Damage Estimation for Various Release Methods in Nanoimprint Lithography Reviewed

    T. Shiotsu(学生), N. Nishikura(学生), M. Yasuda, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B 雑誌   Vol.31 ( No.6 )   2013.11

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    Kind of work:Joint Work  

  • Molecular Dynamics Study of Electron-Irradiation Effects on Mechanical Properties of Carbon Nanotubes Reviewed

    K. Tada, M. Yasuda, T. Mitsueda, R. Honda, H. Kawata and Y. Hirai

    Microelectron. Eng. 雑誌   Vol.107   50 - 53   2013.07

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    Kind of work:Joint Work  

  • Pattern Size Trimming by UV Exposure for Resist Patterns Fabricated by Thermal Nanoimprint Lithography Reviewed

    H. Noma(学生), H. Kawata, M. Yasuda and Y. Hirai

    J. Photopolym. Sci. Technol. 雑誌   Vol.26 ( No.1 )   109 - 112   2013.07

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    Kind of work:Joint Work  

  • Molecular Dynamics Study of the Structural Modification of Graphene by Electron Irradiation Reviewed

    Y. Asayama(学生), M. Yasuda, K. Tada, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol., B   Vol.30 ( No.6 )   2012.11

  • Strength enhancement of nano patterns from edge lithography for nanoimprint mold Reviewed

    J. Sakamoto(学生), H. Noma(学生), N. Fujikawa(学生), H. Kawata, M. Yasuda, Y. Hirai

    Microelectron. Eng.   Vol.98   189 - 193   2012.10

  • Performance Evaluation of Carbon Nanotube-Based Oscillators and Bearings under Electron Irradiation: Molecular Dynamics Study Reviewed

    M. Yasuda, Y. Chihara(学生), R. Mimura(学生), Y. Kimoto, H. Kawata and Y. Hirai

    Microelectron. Eng.   Vol.97   241 - 246   2012.09

  • A Consideration of Important Factor on Demolding Force for Various Molds Reviewed

    H. Kawata, J. Ishihara(学生), T. Tanabe(学生), M. Yasuda, Y. Hirai

    J. Photopolymer Sci. Technol.   Vol.25 ( No.2 )   211 - 216   2012.08

  • Pattern Size Effects on Demolding Force for Imprint Process Reviewed

    N. Fujikawa(学生), H. Kawata, M. Yasuda, Y. Hirai

    J. Photopolymer Sci. Technol.   Vol.25 ( No.2 )   245 - 248   2012.08

  • Impact of Resist Shrinkage and Its Correction in Nanoimprint Lithography Reviewed

    A. Horiba(学生), M. Yasuda, H. Kawata, M. Okada, S. Matsui and Y. Hirai

    Jpn. J. Appl. Phys.   Vol.51 ( No.6 )   2012.06

  • PEBSI - A Monte Carlo Simulator for Bremsstrahlung Arising from Electrons Colliding with Thin Solid-State Targets Reviewed

    G. Weber, R. Märtin, A. Surzhykov, M. Yasuda, V. A. Yerokhin and Th. Stöhlker

    Nucl. Instrum. and Meth., B   Vol.279   155 - 159   2012.05

  • Atomic Step Patterning in Nanoimprint Lithography: Molecular Dynamics Study Reviewed

    K. Tada, M. Yasuda, G. Tan, Y. Miyake, H. Kawata, M. Yoshimoto and Y. Hirai

    J. Vac. Sci. Technol. B   Vol.29 ( No.6 )   2011.11

  • Computational Study of Electron-Irradiation Effects in Carbon Nanomaterials on Substrates Reviewed

    Y. Chihara, M. Yasuda, S. Wakuda, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B   Vol.29 ( No.6 )   2011.11

  • High Aspect Ratio Fine Pattern Transfer Using a Novel Mold by Nanoimprint Lithography Reviewed

    J. Sakamoto, N. Fujikawa, N. Nishikura, H. Kawata, M. Yasuda and Y. Hirai

    J. Vac. Sci. Technol. B   Vol.29 ( No.6 )   2011.11

  • High Aspect Ratio Nano Mold Fabrication by Advanced Edge Lithography without CVD Reviewed

    J. Sakamoto, T. Nishino, H. Kawata, M. Yasuda and Y. Hirai

    Microelectron. Eng.   Vol.88 ( No.8 )   1992 - 1996   2011.08

  • 25nm Wide Silicon Trench Fabrication by Edge Lithography Reviewed

    J. Sakamoto, T. Nishino, H. Kawata, M. Yasuda and Y. Hirai

    Jpn. J. Appl. Phys.   Vol.50 ( No.8 )   2011.08

  • Computational Study on Polymer Filling Process in Nanoimprint Lithography Reviewed

    M. Yasuda, K. Araki, A. Taga, H. Kawata and Y. Hirai

    Microelectron. Eng.   Vol.88 ( No.8 )   2188 - 2191   2011.08

  • Computational Study on Structural Modification of Single-Walled Carbon Nanotubes by Electron Irradiation Reviewed

    M. Yasuda, R. Mimura, H. Kawata and Y. Hirai

    J. Appl. Phys.   Vol.109 ( No.5 )   2011.03

  • Impact of Molecular Size on Resist Filling Process in Nanoimprint Lithography: Molecular Dynamics Study Reviewed

    A. Taga, M. Yasuda, H. Kawata and Y. Hirai

    J. Vac. Sci. Technol. B   Vol.28 ( No.6 )   2010.11

  • Process-Simulation System for UV-Nanoimprint Lithography Reviewed

    M. Shibata, A. Horiba, Y. Nagaoka, H. Kawata, M. Yasuda and Y. Hirai

    J. Vac. Sci. Technol. B   Vol.28 ( No.6 )   2010.11

  • Impact of Substrate Deformation on Demolding Force for Thermal Imprint Process Reviewed

    H. Kawata, Y. Watanabe, N. Fujikawa, M. Yasuda and Y. Hirai

    J. Vac. Sci. Technol. B   Vol.28 ( No.6 )   2010.11

  • Molecular Dynamics Study on Compressive Strength of Monocrystalline, Nanocrystalline and Amorphous Si Mold for Nanoimprint Lithography Reviewed

    K. Tada, S. Horimoto, Y. Kimoto, M. Yasuda, H. Kawata and Y. Hirai

    Microelectron. Eng.   Vol.87 ( No.10 )   1816 - 1820   2010.10

  • Fabrication of Cantilevers by Two-Step Transfer Process without Lithography Reviewed

    H. Kawata, K. Ryugou, S. Ohta, M. Yasuda and Y. Hirai

    Jpn. J. Appl. Phys.   Vol.48 ( No.6 )   2009.06

  • Molecular Dynamics Study of Nanoimprint Lithography for Glass Materials Reviewed

    K. Tada, Y. Kimoto, M. Yasuda, H. Kawata and Y. Hirai

    Jpn. J. Appl. Phys.   Vol.48 ( No.6 )   2009.06

  • Silicon Template Fabrication for Imprint Lithography with a Very Smooth Side Wall Profile Reviewed

    H. Kawata, M. Yasuda and Y. Hirai

    Thin Solid Films   Vol.517 ( No.14 )   3862 - 3865   2009.05

  • Silicon Template Fabrication for Imprint Process with Good Demolding Characteristics Reviewed

    H. Kawata, M. Matsue, K. Kubo, M. Yasuda and Y. Hirai

    Microelectron. Eng.   Vol.86 ( No.4-6 )   700 - 704   2009.04

  • Time-Dependent Charge Distributions in Polymer Films under Electron Beam Irradiation Reviewed

    M. Yasuda, Y. Kainuma, H. Kawata, Y. Hirai, Y. Tanaka, R. Watanabe and M. Kotera

    J. Appl. Phys. 雑誌   Vol.104 ( No.12 )   2008.12

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    Kind of work:Joint Work  

  • 熱インプリント法におけるモールドの側壁ラフネスと離型性の関係 Reviewed

    川田博昭、石原洵也(学生)、鹿山昌代(学生)、安田雅昭、平井義彦

    電気学会論文誌E 雑誌   Vol.128 ( No.8 )   325 - 330   2008.08

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    Kind of work:Joint Work  

  • Sheath Voltage Estimation for Inductively Coupled Plasama Etcher by Impedance Analysis Reviewed

    H. Kawata, M. Yasuda and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.8 )   6914 - 6916   2008.08

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    Kind of work:Joint Work  

  • Analysis of Charging Phenomena of Polymer Films on Silicon Substrates under Electron Beam Irradiation Reviewed

    M. Yasuda, K. Morimoto(学生), Y. Kainuma(学生), H. Kawata and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.6 )   4890 - 4892   2008.06

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    Kind of work:Joint Work  

  • Cantilever Fabrication by Force-Free Release Transfer Reviewed

    H. Kawata, K. Ryugou(学生), S. Ohta(学生), M. Yasuda and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.6 )   5248 - 5251   2008.06

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    Kind of work:Joint Work  

  • Molecular Dynamics Study on Yield Stress of Si Mold for Nanoimprint Lithography Reviewed

    K. Tada(学生), M. Yasuda, Y. Kimoto, H. Kawata and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.4 )   2320 - 2323   2008.04

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    Kind of work:Joint Work  

  • Molecular Dynamics Study of Electron-Irradiation Effects in Single-Walled Carbon Nanotubes Reviewed

    M. Yasuda, Y. Kimoto, K. Tada, H. Mori, S. Akita, Y. Nakayama and Y. Hirai

    Phys. Rev. B 雑誌   Vol.75 ( No.20 )   2007.05

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    Kind of work:Joint Work  

  • Fabrication of Si Mold with Smooth Side Wall by New Plasma Etching Process Reviewed

    H. Kawata, M. Yasuda and Y. Hirai

    Microelectron. Eng 雑誌   Vol.84   1140 - 1143   2007.02

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    Kind of work:Joint Work  

  • Si Etching with High Aspect Ratio and Smooth Side Profile for Mold Fabrication Reviewed

    H. Kawata, M. Yasuda and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.45 ( No. 6B )   5597 - 5601   2006.06

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    Kind of work:Joint Work  

  • Simple Method for Ion Current Measurement at RF Biased Electrode Reviewed

    H. Kawata, M. Yasuda and Y. Hirai

    Thin Solid Films 雑誌   Vol.506/507   683 - 687   2006.05

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    Kind of work:Joint Work  

  • A Simulation of Energy-Filtered Backscattered Electron Signals from Subsurface Cu Interconnect Structures Reviewed

    M. Yasuda, Y. Suzuki(学生), H. Kawata and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol.44 ( No. 7B )   5515 - 5519   2005.07

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    Kind of work:Joint Work  

  • Ni Cantilever Fabrication by Transfer Process without Sacrificial Layer Reviewed

    H. Kawata, M. Yasuda and Y. Hirai

    Sensors and Materials 雑誌   Vol 16 ( No.4 )   211 - 222   2004.09

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    Kind of work:Joint Work  

  • A Monte Carlo Calculation of Secondary Electron Emission from Organic Compounds Reviewed

    M. Yasuda, T. Nobuo(学生) and H. Kawata

    Jpn. J. Appl. Phys. 雑誌   Vol. 43 ( No. 6B )   4004 - 4008   2004.06

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    Kind of work:Joint Work  

  • イメージリバーサルレジストを犠牲層とした付着の少ない表面マイクロマシン作製プロセス Reviewed

    川田博昭, 安田雅昭

    電気学会論文集E 雑誌   Vol.124 ( No.3 )   69 - 74   2004.03

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    Kind of work:Joint Work  

  • New Fine Metal Pattern Fabrications by Transferal Process Reviewed

    H. Kawata, T.Ueno(学生), M. Yasuda and Y. Hirai

    Jpn. J. Appl. Phys. 雑誌   Vol. 42 ( No. 6B )   3854 - 3858   2003.06

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    Kind of work:Joint Work  

  • Analysis of Backscattered Electron Signals in X-ray Mask Inspection Reviewed

    M. Yasuda and H. Kawata

    Jpn. J. Appl. Phys. 雑誌   Vol. 42 ( No. 6B )   3946 - 3949   2003.06

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    Kind of work:Joint Work  

  • Monte Carlo Study of the Spin Polarization Enhancement in the Low Energy Secondary Electron Emission from Ferromagnetic Materials Reviewed

    M. Yasuda, R. Katsuse(学生), H. Kawata and K. Murata

    Surf. Interface Anal. 雑誌   Vol. 35 ( No.1 )   84 - 88   2003.01

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    Kind of work:Joint Work  

  • Quantitative Electron Microprobe Analysis of Aluminum, Copper, and Gold Thin Films on Silicon Substrates Reviewed

    M. Yasuda, S. Yamauchi, H. Kawata and K. Murata

    J. Appl. Phys. 雑誌   Vol. 92 ( No.6 )   3403 - 3409   2002.09

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    Kind of work:Joint Work  

  • A Monte Carlo Study of Magnetic Domain Images in a Spin-Polarized Scanninng Electron Microscope Reviewed

    M. Yasuda, R. Katsuse(学生), H. Kawata and K. Murata

    Jpn. J. Appl. Phys. 雑誌   Vol. 41 ( No.6B )   4246 - 4249   2002.06

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    Kind of work:Joint Work  

  • Long Ni Cantilever Fabrication with New Sacrificial Process Reviewed

    H. Kawata, J. Tabata(学生), T. Matsunaga(学生), M. Yasuda and K. Murata

    Jpn. J. Appl. Phys. 雑誌   Vol. 41 ( No.6B )   4327 - 4331   2002.06

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    Kind of work:Joint Work  

  • Performance Evaluation of the Multi-Stage Mott Polarimeter Using the Monte Carlo Simulation Reviewed

    K. Tamura(学生), M. Yasuda, M. Kotera , and K. Murata

    Rev. Sci. Instrum 雑誌   Vol.72 ( No.10 )   3921 - 3926   2001.10

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    Kind of work:Joint Work  

  • A Monte Carlo Study of Spin-Polarized Electron Backscattering from Gold Thin Films Reviewed

    M. Yasuda, K. Tamura(学生), H. Kawata, K. Murata , and M. Kotera

    Nucl. Instrum. Meth. B 雑誌   Vol.183 ( No.3-4 )   196 - 202   2001.10

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    Kind of work:Joint Work  

  • Monte Carlo Study of Backscattered Electron Signals from Microstructures of X-Ray Masks Reviewed

    M. Yasuda, K. Fujii, H. Kawata, and K. Murata

    Optik 雑誌   Vol.112 ( No.8 )   321 - 328   2001.08

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    Kind of work:Joint Work  

  • Simulation of Spin-Polarized Secondary Electrons Reviewed

    M. Yasuda, K. Tamura(学生), H. Kawata, and K. Murata

    J. Phys. D : Appl. Phys. 雑誌   Vol.34 ( No.13 )   1955 - 1958   2001.07

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    Kind of work:Joint Work  

  • スピン偏極二次電子のモンテカルロシミュレーション Reviewed

    安田雅昭, 田村圭司(学生), 勝瀬龍平(学生), 川田博昭, 村田顕二

    真空 雑誌   Vol. 44 ( No.3 )   256 - 259   2001.03

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    Kind of work:Joint Work  

  • 誘導結合型プラズマにおけるアンテナ電流とプラズマパラメータの関係 Reviewed

    川田博昭, 彌永英倫(学生), 松永崇(学生), 安田雅昭, 村田顕二

    真空 雑誌   Vol. 44 ( No.3 )   260 - 263   2001.03

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    Kind of work:Joint Work  

  • Analysis of the Spin Polarization of Secondary Electrons Emitted from Au/Fe Reviewed

    M. Yasuda, K. Tamura(学生), H. Kawata, K. Murata, T. Furukawa, and K. Koike

    Appl. Surf. Sci. 雑誌   Vol.169/170 ( No.1-4 )   77 - 80   2001.01

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    Kind of work:Joint Work  

  • Fabrication of a New Electrostatic Linear Actuator Reviewed

    T. Matsunaga(学生), K. Kondoh, M. Kumagae(学生), H. Kawata, M. Yasuda, K. Murata, and M. Yoshitake

    Jpn. J. Appl. Phys. 雑誌   Vol. 39 ( No.12B )   7115 - 7119   2000.12

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    Kind of work:Joint Work  

  • GaAs/AlxGa1-xAs超格子の反射電子像の解析 Reviewed

    安田雅昭, 宇根岳史(学生), 川田博昭, 村田顕二

    真空 雑誌   Vol. 43 ( No.3 )   255 - 258   2000.03

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    Kind of work:Joint Work  

  • スピン偏極走査電子顕微鏡における磁区コントラストの解析 Reviewed

    田村圭司(学生), 安田雅昭, 村田顕二, 小寺正敏

    真空 雑誌   Vol.43 ( No.3 )   259 - 262   2000.03

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    Kind of work:Joint Work  

  • Analysis of the Spin Polarization of Secondary Electrons Emitted from Permalloy Polycristals Reviewed

    K. Tamura(学生), M. Yasuda, K. Murata, K. Koike, and M. Kotera

    Jpn. J. Appl. Phys. 雑誌   Vol. 38 ( No.12B )   7173 - 7175   1999.12

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    Kind of work:Joint Work  

  • In Situ Measurements of the Resist Etch Rate for Submicron Patterns Reviewed

    H. Kawata, H. Fukuda(学生), T. Matsunaga(学生), M. Yasuda, and K. Murata

    Jpn. J. Appl. Phys. 雑誌   Vol. 38 ( No.7B )   4478 - 4482   1999.07

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    Kind of work:Joint Work  

  • Mott検出器の高感度化に関する研究 Reviewed

    田村圭司(学生), 安田雅昭, 村田顕二, 小寺正敏, 小池和幸

    真空 雑誌   Vol.42 ( No.3 )   361 - 364   1999.03

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    Kind of work:Joint Work  

  • A Simulation of Electron Scattering in Magnetic Materials Reviewed

    K. Tamura(学生), M. Yasuda, K. Murata , and M. Kotera

    Jpn. J. Appl. Phys. 雑誌   Vol. 37 ( No.12B )   7028 - 7031   1998.12

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    Kind of work:Joint Work  

  • Power Measurements for Radio-Frequency Discharges with a Parallel-Plate-Type Reactor Reviewed

    H. Kawata, T. Kubo(学生), M. Yasuda, and K. Murata

    J. Electrochem. Soc. 雑誌   Vol.145 ( No.5 )   1701 - 1708   1998.05

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    Kind of work:Joint Work  

  • Resist Etching with Parallel-Plate RF Plasmas Enhanced by a Cusp Magnetic Field Reviewed

    H. Kawata, T. Kubo(学生), M. Yasuda, and K. Murata

    Jpn. J. Appl. Phys. 雑誌   Vol.36 ( No.7B )   4879 - 4885   1997.07

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    Kind of work:Joint Work  

  • Monte Carlo Simulation of Secondary Electron Emission from Thin Film/Substrate Targets Reviewed

    K. Murata, M. Yasuda, and H. Kawata

    Scanning Microsc. 雑誌   Vol.10 ( No.3 )   613 - 624   1996.09

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    Kind of work:Joint Work  

  • The Spatial Distribution of Backscattered Electrons Calculated by a Simple Model Reviewed

    M. Yasuda, H. Kawata ,and K. Murata

    phys. stat. sol. (a) 雑誌   Vol.153 ( No.1 )   133 - 144   1996.01

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    Kind of work:Joint Work  

  • Effects of the Introduction of the Discrete Energy Loss Process into Monte Carlo Simulation of Electron Scattering Reviewed

    K. Murata, M. Yasuda ,and H. Kawata

    Scanning 雑誌   Vol.17 ( No.4 )   228 - 234   1995.07

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    Kind of work:Joint Work  

  • Study of the Spatial Distribution of Backscattered Electrons from a Gold Target with a New Monte Carlo Simulation Reviewed

    M. Yasuda, H. Kawata , and K. Murata

    J. Appl. Phys. 雑誌   Vol.77 ( No.9 )   4706 - 4713   1995.05

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    Kind of work:Joint Work  

  • Effects of Heavy Atoms Added into a Resist on Energy Absorption in X-Ray Lithography Reviewed

    K. Murata, M. Yasuda, H. Kawata, and T. Matsuda

    J. Vac. Sci. Technol. B 雑誌   Vol.13 ( No.3 )   821 - 825   1995.05

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    Kind of work:Joint Work  

  • Resist Heating Effect in Electron Beam Lithography Reviewed

    M. Yasuda, H. Kawata, K. Murata, K. Hashimoto, Y. Hirai , and N. Nomura

    J. Vac. Sci. Technol. B 雑誌   Vol.12 ( No.3 )   1362 - 1366   1994.05

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    Kind of work:Joint Work  

  • The Spatial Distribution of Backscattered Electrons Revisited with a New Monte Carlo Simulation Reviewed

    K. Murata, M. Yasuda , and H. Kawata

    Scanning Microsc. 雑誌   Vol.6 ( No.4 )   943 - 954   1992.12

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    Kind of work:Joint Work  

▼display all

Books and Other Publications

  • 電子・イオンビームハンドブック 第4版、6.1節

    安田 雅昭 他( Role: Joint author)

    日本学術振興会132委員会  2021.03 

  • Computational Chemistry, Chapter 4

    M. Yasuda and K. Tada( Role: Joint author)

    Nova Science Publishers  2014.07 

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    Responsible for pages:63-83  

  • Lithography, Chapter 26

    M. Yasuda, K. Tada and Y. Hirai( Role: Joint author)

    Intech  2010.02 

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    Responsible for pages:543-556  

  • 計算シミュレーションと分析データ解析、4.2節

    村田顕二、安田雅昭( Role: Joint author)

    丸善株式会社  2008.01 

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    Responsible for pages:79-91  

Presentations

  • ビルトインレンズマスクを用いた三次元フォトリソグラフィによるパターン形成 Domestic conference

    田中敏章、安田雅昭、笹子勝、平井義彦

    第71回応用物理学会春季学術講演会  2024.03  応用物理学会

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    Presentation type:Oral presentation (general)  

    Venue:東京  

  • ナノインプリントによるAR/VRグラス用傾斜型回折格子の離型プロセスに関する考察 Domestic conference

    國藤裕成、安田雅昭、平井義彦

    第71回応用物理学会春季学術講演会  2024.03  応用物理学会

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    Presentation type:Oral presentation (general)  

    Venue:東京  

  • ディープラーニング支援による化学増幅型レジストの開発 Domestic conference

    唐晨、田中敏章、関口淳、平井義彦、安田雅昭

    第71回応用物理学会春季学術講演会  2024.03  応用物理学会

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    Presentation type:Oral presentation (general)  

    Venue:東京  

  • 化学増幅系レジストを対象とした電子線リソグラフィの 確率論法-分子動力学法ハイブリットシミュレーション(2) Domestic conference

    若松大翔、中村大紀、安田雅昭

    第71回応用物理学会春季学術講演会  2024.03  応用物理学会

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    Presentation type:Oral presentation (general)  

    Venue:東京  

  • A Novel Approach for Chemically Amplified Resist Synthesis Assisted by Deep Learning International conference

    C. Tang, T. Tanaka, A. Sekiguchi, Y. Hirai, M. Yasuda

    36th International Microprocesses and Nanotechnology Conference (MNC 2023)  2023.11  The Japan Society of Applied Physics

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    Presentation type:Poster presentation  

    Venue:Sapporo, Japan  

  • Smart process window proposal system for demanded conditions in nanoimprint assisted by deep learning International conference

    Y. Kunitou, T. Tanaka, M. Yasuda, Y. Hirai

    36th International Microprocesses and Nanotechnology Conference (MNC 2023)  2023.11  The Japan Society of Applied Physics

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    Presentation type:Poster presentation  

    Venue:Sapporo, Japan  

  • 電子線リソグラフィにおけるネガ型レジストの現像初期過程の分子動力学解析 Domestic conference

    田中琉暉、山田絵斗、安田雅昭

    第84回応用物理学会秋季学術講演会  2023.09  応用物理学会

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    Presentation type:Oral presentation (general)  

    Venue:熊本  

  • Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography Invited International conference

    K. Yamada, Y. Hirai and M. Yasuda

    The 40th International Conference of Photopolymer Science and Technology  2023.06  The Society of Photopolymer Science and Technology

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    Presentation type:Oral presentation (invited, special)  

    Venue:Makuhari, Japan  

  • Developing an endoscope lens with super water repellant antifouling function using biomimetics materials International conference

    A. Sekiguchi, H. Minami, M. Yasuda and Y. Hirai

    The 40th International Conference of Photopolymer Science and Technology  2023.06  The Society of Photopolymer Science and Technology

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    Presentation type:Oral presentation (general)  

    Venue:Makuhari, Japan  

  • Application of Machine Learning to Nanoimprinting Processes and Materials Design International conference

    Y. Hirai, Y. Kunitou and M. Yasuda

    The 40th International Conference of Photopolymer Science and Technology  2023.06  The Society of Photopolymer Science and Technology

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    Presentation type:Oral presentation (general)  

    Venue:Makuhari, Japan  

  • Simulation study on mechanical properties of SiO2 nanorods under electron irradiation Domestic conference

    T. Ito, J. Yamaguchi, M. Yasuda

    2023.06 

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    Presentation type:Poster presentation  

  • Simulation analysis of backscattered electron signals for deformation of silicon crystals Domestic conference

    J. Yamaguchi, T. Ito, M. Yasuda

    2023.06 

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    Presentation type:Oral presentation (general)  

  • 電子線改質されたグラフェンのフォノン輸送の分子動力学解析(2) Domestic conference

    吉田健二,植村拓, 安田雅昭

    第70回応⽤物理学会春季学術講演会  2023.03 

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    Presentation type:Oral presentation (general)  

    Venue:東京  

  • 化学増幅系レジストを対象とした電子線リソグラフィの確率論法-分子動力学法ハイブリットシミュレーション Domestic conference

    中村大紀, 山田絵斗, 井上文太, 安田雅昭

    第70回応⽤物理学会春季学術講演会  2023.03 

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    Presentation type:Oral presentation (general)  

    Venue:東京  

  • Molecular dynamics study of phonon density of states of electron-irradiated graphene International conference

    K. Yoshida, T. Uemura, M. Yasuda

    14th International Symposium on Atomic Level Characterizations for New Materials and Devices '22  2022.10 

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    Presentation type:Poster presentation  

    Venue:Okinawa  

  • Computational study of mechanical properties of SiO2 nanorods under electron irradiation International conference

    T. Ito, J. Yamaguchi, M. Yasuda

    14th International Symposium on Atomic Level Characterizations for New Materials and Devices '22  2022.10 

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    Presentation type:Poster presentation  

    Venue:Okinawa  

  • Fabrication of self-standing PMMA film with 0.5 μm throughholes by imprint and photolithography hybrid process International conference

    H. Kawata, M. Yasuda, Y. Hirai, and H. Kikuta

    The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

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    Presentation type:Poster presentation  

    Venue:Toyama  

  • Study on smart process window design for thermal nanoimprint lithography using deep learning systems International conference

    Y. Kunitou, R. Yamamura, K. Kameyama, M. Yasuda and Y. Hirai

    The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

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    Presentation type:Poster presentation  

    Venue:Toyama  

  • Compatibility of Thermal Property among in Nanoimprint Resin International conference

    K. Kameyama, Y. Kunitou, H. Kawata, M. Yasuda and Y. Hirai

    The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

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    Presentation type:Poster presentation  

    Venue:Toyama  

  • Stochastic Simulation of Deactivation Effects in UV Curable Resin International conference

    D. Nakamura, Y. Hirai, and M. Yasuda

    The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

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    Presentation type:Poster presentation  

    Venue:Toyama  

  • Computational study on the releasing process of slanted diffraction structure for AR glasses International conference

    R. Yamamura, Y. Kunitou, K. Kameyama, M. Yasuda and Y. Hirai

    The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

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    Presentation type:Poster presentation  

    Venue:Toyama  

  • 確率論的シミュレーションと深層学習を用いた電子線リソグラフィのパターン形状の予測 Domestic conference

    井上文太、平井義彦、安田雅昭

    第71回高分子討論会  2022.09 

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    Presentation type:Oral presentation (general)  

    Venue:札幌  

  • ディープラーニングを利用した熱ナノインプリントのプロセス設計 Domestic conference

    國藤裕成、山村龍平、亀山開、安田雅昭、平井義彦

    第83回応用物理学会秋季学術講演会  2022.09 

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    Presentation type:Oral presentation (general)  

    Venue:仙台  

  • ディープラーニングのための熱ナノインプリント用樹脂の熱特性の検証 Domestic conference

    亀山開、國藤裕成、川田博昭、安田雅昭、平井義彦

    第83回応用物理学会秋季学術講演会  2022.09 

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    Presentation type:Oral presentation (general)  

    Venue:仙台  

  • ネガ型レジストを対象とした電子線リソグラフィの分子動力学解析 Domestic conference

    山田絵斗、平井義彦、安田雅昭

    第83回応用物理学会秋季学術講演会  2022.09 

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    Presentation type:Oral presentation (general)  

    Venue:仙台  

  • 分子シミュレーションと深層学習による電子線リソグラフィのパターン形状予測システム Domestic conference

    井上文太、平井義彦、安田雅昭

    第83回応用物理学会秋季学術講演会  2022.09 

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    Presentation type:Oral presentation (general)  

    Venue:仙台  

  • 電子線改質されたグラフェンのフォノン輸送の分子動力学解析 Domestic conference

    吉田健二、植村拓、安田雅昭

    第83回応用物理学会秋季学術講演会  2022.09 

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    Presentation type:Oral presentation (general)  

    Venue:仙台  

  • 熱インプリントとフォトリソ併用による貫通孔付き自立樹脂薄膜の作製 Domestic conference

    川田博昭、安田雅昭、平井義彦

    第83回応用物理学会秋季学術講演会  2022.09 

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    Presentation type:Oral presentation (general)  

    Venue:仙台  

  • 電子と固体の相互作用の理論解析とその応用 Domestic conference

    安田雅昭

    2022年ナノ荷電粒子ビームに関する研究会  2022.08  応用物理学会 ナノ荷電粒子ビーム産学連携委員会

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    Presentation type:Public lecture, seminar, tutorial, course, or other speech  

    Venue:東京  

  • Stochastic simulation of pattern formation in EUV resists with photo-decomposable quenchers Invited International conference

    K. Imai, B. Inoue, Y. Hirai, M. Yasuda

    2022.06 

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    Presentation type:Oral presentation (invited, special)  

    Venue:Online  

  • Process design for glycerol contained PVA based on hybrid deep learning system International conference

    K. Kameyama, Y. Kunitou, H. Kawata, M. Yasuda, Y. Hirai

    The 39th Int. Conf. of Photopolymer Science and Technology  2022.06 

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    Presentation type:Oral presentation (general)  

    Venue:Online  

  • Computational study of release process on tilted diffraction structure for AR glasses International conference

    R. Yamamura, Y. Kunitou, M. Yasuda, Y. Hirai

    The 39th Int. Conf. of Photopolymer Science and Technology  2022.06 

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    Presentation type:Oral presentation (general)  

    Venue:Online  

  • 深層学習を用いた金属材料の二次電子収率の予測 Domestic conference

    楠見将啓、平井義彦、安田雅昭

    日本顕微鏡学会第78回学術講演会  2022.05 

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    Presentation type:Oral presentation (general)  

    Venue:郡山  

  • スマートグラス用傾斜回折パターンの離型プロセス・材料に関する考察 Domestic conference

    山村龍平,國藤裕成,亀山開,安田雅昭,平井義彦

    第69回応用物理学会春季学術講演会  2022.03 

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    Presentation type:Oral presentation (general)  

    Venue:オンライン  

  • Smart process design using deep learning for thermal nanoimprint International conference

    R. Yamamura, S. Tsukamoto, K. Kameyama, H. Tanabe, H. Kawata, M. Yasuda, Y. Hirai

    The 20th International Conference on Nanoimprint and Nanoprint Technologies  2021.11 

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    Presentation type:Oral presentation (general)  

    Venue:Online  

  • Study on Filling Process of Molecular Weight Dispersive Resin for Ultra fine Cavity International conference

    K. Nakajima, M. Yasuda, Y. Miyashita, R. Yamamura, Y. Hirai

    The 20th International Conference on Nanoimprint and Nanoprint Technologies  2021.11 

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    Presentation type:Oral presentation (general)  

    Venue:Online  

  • Study of secondary electron emission based on deep learning systems International conference

    M. Kusumi, Y. Hirai, and M. Yasuda

    13th Int. Symp. on Atomic Level Characterizations for New Materials and Devices '21  2021.10 

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    Presentation type:Poster presentation  

  • Fabrication of self-standing thin films with small through-holes by imprint and photolithography hybrid process

    H. Tanabe, H. Kawata, M. Yasuda, Y. Hirai, and H. Kikuta

    2021 Int. Microprocesses and Nanotechnology Conf.  2021.10 

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    Presentation type:Poster presentation  

  • 機械学習によるNILプロセス設計 Domestic conference

    山村龍平,塚本創,亀山開,田邉英毅,川田博昭,安田雅昭,平井義彦

    応用物理学会 ナノインプリント技術研究会  2021.10 

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    Presentation type:Oral presentation (general)  

    Venue:オンライン  

  • Si系材料添加における193nm液浸レジストの表面特性制御 Domestic conference

    唐晨,関口淳,安田雅昭,平井義彦

    第82回応用物理学会秋季学術講演会  2021.09 

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    Presentation type:Poster presentation  

  • 低温熱ナノインプリントを用いた微細貫通孔付き自立樹脂薄膜の作製 Domestic conference

    田邉英毅,川田博昭,安田雅昭,平井義彦

    第82回応用物理学会秋季学術講演会  2021.09 

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    Presentation type:Poster presentation  

  • ディープラーニングを利用した二次電子放出の研究 Domestic conference

    楠見将啓,平井義彦,安田雅昭

    第82回応用物理学会秋季学術講演会  2021.09 

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    Presentation type:Poster presentation  

  • 電子線改質したグラフェンの振動特性の分子動力学解析 Domestic conference

    植村拓,平井義彦,安田雅昭

    第82回応用物理学会秋季学術講演会  2021.09 

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    Presentation type:Poster presentation  

  • Smart design system for thermal nanoimprint process using hybrid deep learning International conference

    R. Yamamura, S. Tsukamoto, K. Kameyama, H. Tanabe, H. Kawata, M. Yasuda, Y. Hirai

    47th international conference on Micro and Nano Engineering  2021.09 

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    Venue:Hybrid, Itally  

  • ハイブリッド・ニューラルネットワークを利用したナノインプリントプロセス ,材料のスマート設計 Domestic conference

    塚本創,山村龍平,田邉英毅,亀山開,川田博昭,安田雅昭,平井義彦

    応用物理学会 次世代リソグラフィ研究会 ワークショップ  2021.07 

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    Presentation type:Oral presentation (general)  

    Venue:オンライン  

  • Computational Study of Stochastic Effects in Extreme Ultraviolet Lithography Invited International conference

    M. Yasuda, M. Koyama, K. Imai, M. Shirai, and Y. Hirai

    38th Int. Conf. of Photopolymer Science and Technology  2021.06 

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    Presentation type:Poster presentation  

  • Stochastic Simulation of Development Process in Electron Beam Lithography International conference

    B. Inoue, M. Koyama, A. Sekiguchi, M. Shirai, Y. Hirai, and M. Yasuda

    38th Int. Conf. of Photopolymer Science and Technology  2021.06 

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    Presentation type:Poster presentation  

  • Fabrication of Thin Resin Film with Small Through Holes by Low Temperature Nanoimprint Process International conference

    H. Kawata, S. Shimizu, H. Tanabe, M. Yasuda, H. Kikuta, and Y. Hirai

    38th Int. Conf. of Photopolymer Science and Technology  2021.06 

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    Presentation type:Poster presentation  

  • Molecular Dynamics Study on the Filling Process of Molecular Weight Dispersive Resist into Nanoscale Cavities International conference

    K. Nakajima, R. Yamamura, Y. Miyashita, M. Yasuda, and Y. Hirai

    38th Int. Conf. of Photopolymer Science and Technology  2021.06 

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    Presentation type:Poster presentation  

  • Proposal of Hybrid Deep Learning Systems for Process and Material Design in Thermal Nanoimprint Lithography International conference

    S. Tsukamoto, K. Kameyama, H. Tanabe, R. Yamamura, H. Kawata, M. Yasuda, and Y. Hirai

    38th Int. Conf. of Photopolymer Science and Technology  2021.06 

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    Presentation type:Poster presentation  

  • Optimization of the Built-in Lens Mask for Three-Dimensional Photo Lithography International conference

    T. Osumi, M. Sasago, M. Yasuda, and Y. Hirai

    64th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication  2021.05 

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    Presentation type:Poster presentation  

  • Process and material design using hybrid machine learning for direct thermal nanoimprint International conference

    S. Tsukamoto, R. Yamamura, H. Tanabe, K. Kameyama, H. Kawata, M. Yasuda, and Y. Hirai

    64th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication  2021.05 

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    Presentation type:Poster presentation  

  • Automatic design of the build-in lens mask for three-dimensional photo lithography International conference

    T. Osumi, M. Sasago, M. Yasuda, and Y. Hirai

    Photomask Japan 2021  2021.04 

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    Presentation type:Poster presentation  

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Outline of collaborative research (seeds)

  • ナノ加工の分子動力学解析

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    ナノインプリントや電子ビームによるナノ加工の分子動力学プロセスシミュレーションの開発と諸問題の解析

  • 電子ビーム励起によるナノ材料の構造変化解析

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    カーボンナノチューブを代表とするナノ材料を対象に、電子線照射による改質・加工・損傷などの現象を理論解析する

  • 電子ビームを用いた顕微鏡・分析・評価技術における諸問題の解析

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    走査電子顕微鏡などの電子ビームを利用した分析・評価装置における信号(二次・反射電子、X線)、像コントラスト、試料帯電などの理論解析を行う

Charge of on-campus class subject

  • 電磁気学1A

    2023   Weekly class   Undergraduate

  • 電子物理系特別演習(電子物性)

    2023   Intensive lecture   Graduate school

  • 電子物理系特別研究第1(電子物性)

    2023   Intensive lecture   Graduate school

  • 電子物理系特別演習第1(電子物性)

    2023   Intensive lecture   Graduate school

  • 気体エレクトロニクス

    2023   Weekly class   Undergraduate

  • 電子物理系特別研究(電子物性)

    2023   Intensive lecture   Graduate school

  • 電子・イオンビーム工学特論

    2023   Weekly class   Graduate school

  • 電子物理系特別研究第2(電子物性)

    2023   Intensive lecture   Graduate school

  • 電子物理系特別演習第2(電子物性)

    2023   Intensive lecture   Graduate school

  • 気体エレクトロニクス

    2022   Weekly class   Undergraduate

  • 電磁気学IB

    2022   Weekly class   Undergraduate

  • 初年次ゼミナール

    2022   Weekly class   Undergraduate

  • 電子物理系特別演習(電子物性)

    2022   Intensive lecture   Graduate school

  • 電子物理系特別演習第1(電子物性)

    2022   Intensive lecture   Graduate school

  • 電子物理系特別研究(電子物性)

    2022   Intensive lecture   Graduate school

  • 電子・イオンビーム工学特論 (中百舌鳥)

    2022   Weekly class   Graduate school

  • 電子物理系特別演習第2(電子物性) (中百舌鳥)

    2022   Intensive lecture   Graduate school

  • Advanced electron and ion beam technology

    2021    

  • Gaseous Electronics

    2021    

  • Electromagnetic Theory I B

    2021    

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