Automatic design of the build-in lens mask for three-dimensional photo lithography Reviewed

T. Osumi, M. Sasago, M. Yasuda, and Y. Hirai

Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology   2021.08

Proposal of Hybrid Deep Learning System for Process and Material Design in Thermal Nanoimprint Lithography Reviewed

S. Tsukamoto, H. Tanabe, R. Yamamura, K. Kameyama, H. Kawata, M. Yasuda, and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   34 ( 2 )   2021.06

Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask Reviewed

T. Osumi, A. Misaka, K. Sato, M. Yasuda, M. Sasago, and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   34 ( 2 )   2021.06

Stochastic Simulation of Development Process in Electron Beam Lithography Reviewed

J. Photopolym. Sci. Technol.   34 ( 6 )   661 - 665   2021

Fabrication of Nickel Plasma Etching Mask by Nano-Imprint Lithography and Electroless Plating Reviewed

S. Shimizu, H. Tanabe, M. Yasuda, Y. Hirai, H. Kawata

J. Photopolym. Sci. Technol. 雑誌   33 ( 5 )   2020.07

Stochastic Simulation of Pattern Formation for Negative-Type Chemically Amplified Resists in Extreme Ultraviolet Lithography Reviewed

M. Yasuda, M. Koyama, K. Imai, M. Shirai, H. Kawata, and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   33 ( 1 )   2020.05

Fabrication of Self-Standing Polystyrene Thin Films with Fine Through Holes by Use of Water Soluble Resin Sacrificial Layer Reviewed

H. Kawata, K. Uchida, M. Yasuda, and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   32   2019.05

Stochastic Simulation of Pattern Formation for Chemically Amplified Resist in Electron Beam Lithography Reviewed

M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda

Jpn. J. Appl. Phys. 雑誌   58   2019.05

Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography Reviewed

M. Yasuda, M. Koyama, K. Fukunari, M. Shirai, H. Kawata and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   32   2019

Stochastic Simulation of Pattern Formation in Electron Beam Lithography Reviewed

M. Yasuda, M. Koyama, M. Shirai, H. Kawata, and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   36 ( 6 )   2018.11

Study on induced strain in direct nanoimprint lithography Reviewed

K. Watanabe, T. Iida, M. Yasuda, H. Kawata and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   57 ( 6 )   2018.06

Computational Study of Pattern Formation in UV Nanoimprint Lithography Reviewed

M. Yasuda, M. Koyama, R. Sakata, M. Shirai, H. Kawata and Y. Hirai

J. Photopolym. Sci. Technol.   31 ( 2 )   2018

Transfer Printing by Use of Delayed UV Cure Resin for Fabricating Multilayer Structures Reviewed

T. Yamamoto, M. Yasuda, Y. Hirai, and H. Kawata

J. Photopolym. Sci. Technol. 雑誌   31   2018

Stochastic Simulation of the UV Curing Process in Nanoimprint Lithography: Pattern Size and Shape Effects in Sub-50 nm Lithography Reviewed

M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda

J. Vac. Sci. Technol. B   35 ( 6 )   2017.11

Computational Study on UV Curing Characteristics in Nanoimprint Lithography: Stochastic Simulation Reviewed

M. Koyama, M. Shirai, H. Kawata, Y. Hirai and M. Yasuda

Jpn. J. Appl. Phys. 雑誌   Vol.56 ( No.6S1 )   2017.06

Multiscale Simulation of the Development Process in Electron Beam Lithography Reviewed

M. Yasuda, S. Hitomi, H. Kawata and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   Vol.30 ( No.2 )   205 - 209   2017.06

Impact of Template Stiffness during Peeling Release in Nanoimprint Lithography Reviewed

F. Chalvin, N. Nakamura, T. Tochino, M. Yasuda, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.34 ( No.6 )   2016.11

Multiphysics Simulation of Nanopatterning in Electron Beam Lithography Reviewed

M. Yasuda, K. Tada and M. Kotera

J. Photopolym. Sci. Technol. 雑誌   Vol.29 ( No.5 )   725 - 730   2016.06

Study on Induced Stress and Strain in Direct Nanoimprint Lithography Reviewed

T. Iida, M. Yasuda, H. Kawata and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   Vol.29 ( No.2 )   225 - 230   2016.06

Impact of Wafer Deformation on Pattern Fabrication for Thermal Nanoimprint Lithography Reviewed

H. Kawata, M. Yasuda and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   Vol.29 ( No.2 )   215 - 219   2016.06

Three-dimensional imaging approach using built-in lens mask lithography Reviewed

T. Tanaka, H. Kikuta, H. Kawata, M. Yasuda, M. Sasago and Y. Hirai

Microelectron. Eng. 雑誌   Vol.158   85 - 90   2016.04

Multiscale simulation of resist pattern shrinkage during scanning electron microscope observations Reviewed

M. Yasuda, Y. Furukawa（学生）, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.33 ( No.6 )   2015.11

Molecular Dynamics Study of Line Edge Roughness and the Proximity Effects in Electron Beam Lithography Reviewed

S. Hitomi（学生）, K. Michishita（学生）, H. Kawata, Y. Hirai and M. Yasuda

J. Photopolym. Sci. Technol. 雑誌   Vol.28 ( No.5 )   677 - 682   2015.11

High Selective Plasma Etching of PMMA to PS Reviewed

K. Shimomukai（学生）, H. Kawata, M. Yasuda and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   Vol.28 ( No.4 )   569 - 572   2015.09

Correlation between Electron-Irradiation Defects and Applied Stress in Graphene: A Molecular Dynamics Study Reviewed

S. Kida（学生）, M. Yamamoto（学生）, K. Tada, H. Kawata, Hirai and M. Yasuda

J. Vac. Sci. Technol. A 雑誌   Vol.33 ( No.5 )   2015.09

Computational Study of the Effect of Side Wall Quality of the Template on Release Force in Nanoimprint Lithography Reviewed

T. Tochino（学生）, K. Uemura（学生）, M. Michalowski, K. Fujii（学生）, M. Yasuda, H. Kawata, Z. Rymuza and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.54 ( No.6S )   2015.06

Defect Formation and Transformation in Graphene under Electron Irradiation: A Molecular Dynamics Study Reviewed

M. Yamamoto（学生）, Y. Asayama（学生）, M. Yasuda, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.32 ( No.6 )   2014.11

Computational Study of the Demolding Process in Nanoimprint Lithography Reviewed

R. Takai（学生） M. Yasuda, T. Tochino（学生）, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.32 ( No.6 )   2014.11

Impact of Resist Shrinkage on the Template Release Process in Nanoimprint Lithography Reviewed

T. Tochino（学生）, T. Shiotsu（学生）, K. Uemura（学生）, M. Yasuda, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.32 ( No.6 )   2014.11

Fabrication of Imprint Mold with Nanotrench Patterns by Edge Lithography Reviewed

H. Noma（学生）, H. Kawata, M. Yasuda and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   Vol.27 ( No.1 )   91 - 94   2014.08

Fabrication of Second Generation Replica Mold by Hybrid Polymer Material Ormostamp Reviewed

H. Noma（学生）, S. Wang, K. Uemura（学生）, K. Shimomukai（学生）, M. Yasuda, H. Kawata, H-C. Scheer and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   Vol.27 ( No.1 )   95 - 98   2014.08

Simulation of the Template Release Process Based on Fracture Mechanics in Nanoimprint Lithography Reviewed

T. Shiotsu（学生）, K. Uemura（学生）, T. Tochino（学生）, S. Ooi, Y. Onishi, M. Yasuda, H. Kawata, T. Kobayashi and Y. Hirai

Microelectron. Eng. 雑誌   Vol.123   105 - 111   2014.07

Electron beam lithography simulation for sub-10 nm patterning Reviewed

K. Michishita（学生）, M. Yasuda, H. Kawata and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.53 ( No.6S )   2014.06

Molecular Simulation of Pattern Formation in Electron Beam Lithography Reviewed

M. Yasuda, H. Sakai, R. Takai, H. Kawata and Y. Hirai

Microelectron. Eng. 雑誌   Vol.112   287 - 290   2013.12

Correlation between Electron Irradiation Defects and Applied Stress in Carbon Nanotubes: A Molecular Dynamics Study Reviewed

M. Yasuda, Y. Chihara（学生）, K. Tada, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.31 ( No.6 )   2013.11

Selective Edge Lithography for Fabricating Imprint Molds with Mixed Scale Patterns Reviewed

H. Noma（学生）, H. Kawata, M. Yasuda and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.31 ( No.6 )   2013.11

Simulation Study on the Template Release Mechanism and Damage Estimation for Various Release Methods in Nanoimprint Lithography Reviewed

T. Shiotsu（学生）, N. Nishikura（学生）, M. Yasuda, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B 雑誌   Vol.31 ( No.6 )   2013.11

Molecular Dynamics Study of Electron-Irradiation Effects on Mechanical Properties of Carbon Nanotubes Reviewed

K. Tada, M. Yasuda, T. Mitsueda, R. Honda, H. Kawata and Y. Hirai

Microelectron. Eng. 雑誌   Vol.107   50 - 53   2013.07

Pattern Size Trimming by UV Exposure for Resist Patterns Fabricated by Thermal Nanoimprint Lithography Reviewed

H. Noma（学生）, H. Kawata, M. Yasuda and Y. Hirai

J. Photopolym. Sci. Technol. 雑誌   Vol.26 ( No.1 )   109 - 112   2013.07

Molecular Dynamics Study of the Structural Modification of Graphene by Electron Irradiation Reviewed

Y. Asayama（学生）, M. Yasuda, K. Tada, H. Kawata and Y. Hirai

J. Vac. Sci. Technol., B   Vol.30 ( No.6 )   2012.11

Strength enhancement of nano patterns from edge lithography for nanoimprint mold Reviewed

J. Sakamoto（学生）, H. Noma（学生）, N. Fujikawa（学生）, H. Kawata, M. Yasuda, Y. Hirai

Microelectron. Eng.   Vol.98   189 - 193   2012.10

Performance Evaluation of Carbon Nanotube-Based Oscillators and Bearings under Electron Irradiation: Molecular Dynamics Study Reviewed

M. Yasuda, Y. Chihara（学生）, R. Mimura（学生）, Y. Kimoto, H. Kawata and Y. Hirai

Microelectron. Eng.   Vol.97   241 - 246   2012.09

A Consideration of Important Factor on Demolding Force for Various Molds Reviewed

H. Kawata, J. Ishihara（学生）, T. Tanabe（学生）, M. Yasuda, Y. Hirai

J. Photopolymer Sci. Technol.   Vol.25 ( No.2 )   211 - 216   2012.08

Pattern Size Effects on Demolding Force for Imprint Process Reviewed

N. Fujikawa（学生）, H. Kawata, M. Yasuda, Y. Hirai

J. Photopolymer Sci. Technol.   Vol.25 ( No.2 )   245 - 248   2012.08

Impact of Resist Shrinkage and Its Correction in Nanoimprint Lithography Reviewed

A. Horiba（学生）, M. Yasuda, H. Kawata, M. Okada, S. Matsui and Y. Hirai

Jpn. J. Appl. Phys.   Vol.51 ( No.6 )   2012.06

PEBSI - A Monte Carlo Simulator for Bremsstrahlung Arising from Electrons Colliding with Thin Solid-State Targets Reviewed

G. Weber, R. Märtin, A. Surzhykov, M. Yasuda, V. A. Yerokhin and Th. Stöhlker

Nucl. Instrum. and Meth., B   Vol.279   155 - 159   2012.05

Atomic Step Patterning in Nanoimprint Lithography: Molecular Dynamics Study Reviewed

K. Tada, M. Yasuda, G. Tan, Y. Miyake, H. Kawata, M. Yoshimoto and Y. Hirai

J. Vac. Sci. Technol. B   Vol.29 ( No.6 )   2011.11

Computational Study of Electron-Irradiation Effects in Carbon Nanomaterials on Substrates Reviewed

Y. Chihara, M. Yasuda, S. Wakuda, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B   Vol.29 ( No.6 )   2011.11

High Aspect Ratio Fine Pattern Transfer Using a Novel Mold by Nanoimprint Lithography Reviewed

J. Sakamoto, N. Fujikawa, N. Nishikura, H. Kawata, M. Yasuda and Y. Hirai

J. Vac. Sci. Technol. B   Vol.29 ( No.6 )   2011.11

High Aspect Ratio Nano Mold Fabrication by Advanced Edge Lithography without CVD Reviewed

J. Sakamoto, T. Nishino, H. Kawata, M. Yasuda and Y. Hirai

Microelectron. Eng.   Vol.88 ( No.8 )   1992 - 1996   2011.08

25nm Wide Silicon Trench Fabrication by Edge Lithography Reviewed

J. Sakamoto, T. Nishino, H. Kawata, M. Yasuda and Y. Hirai

Jpn. J. Appl. Phys.   Vol.50 ( No.8 )   2011.08

Computational Study on Polymer Filling Process in Nanoimprint Lithography Reviewed

M. Yasuda, K. Araki, A. Taga, H. Kawata and Y. Hirai

Microelectron. Eng.   Vol.88 ( No.8 )   2188 - 2191   2011.08

Computational Study on Structural Modification of Single-Walled Carbon Nanotubes by Electron Irradiation Reviewed

M. Yasuda, R. Mimura, H. Kawata and Y. Hirai

J. Appl. Phys.   Vol.109 ( No.5 )   2011.03

Impact of Molecular Size on Resist Filling Process in Nanoimprint Lithography: Molecular Dynamics Study Reviewed

A. Taga, M. Yasuda, H. Kawata and Y. Hirai

J. Vac. Sci. Technol. B   Vol.28 ( No.6 )   2010.11

Process-Simulation System for UV-Nanoimprint Lithography Reviewed

M. Shibata, A. Horiba, Y. Nagaoka, H. Kawata, M. Yasuda and Y. Hirai

J. Vac. Sci. Technol. B   Vol.28 ( No.6 )   2010.11

Impact of Substrate Deformation on Demolding Force for Thermal Imprint Process Reviewed

H. Kawata, Y. Watanabe, N. Fujikawa, M. Yasuda and Y. Hirai

J. Vac. Sci. Technol. B   Vol.28 ( No.6 )   2010.11

Molecular Dynamics Study on Compressive Strength of Monocrystalline, Nanocrystalline and Amorphous Si Mold for Nanoimprint Lithography Reviewed

K. Tada, S. Horimoto, Y. Kimoto, M. Yasuda, H. Kawata and Y. Hirai

Microelectron. Eng.   Vol.87 ( No.10 )   1816 - 1820   2010.10

Fabrication of Cantilevers by Two-Step Transfer Process without Lithography Reviewed

H. Kawata, K. Ryugou, S. Ohta, M. Yasuda and Y. Hirai

Jpn. J. Appl. Phys.   Vol.48 ( No.6 )   2009.06

Molecular Dynamics Study of Nanoimprint Lithography for Glass Materials Reviewed

K. Tada, Y. Kimoto, M. Yasuda, H. Kawata and Y. Hirai

Jpn. J. Appl. Phys.   Vol.48 ( No.6 )   2009.06

Silicon Template Fabrication for Imprint Lithography with a Very Smooth Side Wall Profile Reviewed

H. Kawata, M. Yasuda and Y. Hirai

Thin Solid Films   Vol.517 ( No.14 )   3862 - 3865   2009.05

Silicon Template Fabrication for Imprint Process with Good Demolding Characteristics Reviewed

H. Kawata, M. Matsue, K. Kubo, M. Yasuda and Y. Hirai

Microelectron. Eng.   Vol.86 ( No.4-6 )   700 - 704   2009.04

Time-Dependent Charge Distributions in Polymer Films under Electron Beam Irradiation Reviewed

M. Yasuda, Y. Kainuma, H. Kawata, Y. Hirai, Y. Tanaka, R. Watanabe and M. Kotera

J. Appl. Phys. 雑誌   Vol.104 ( No.12 )   2008.12

熱インプリント法におけるモールドの側壁ラフネスと離型性の関係 Reviewed

川田博昭、石原洵也（学生）、鹿山昌代（学生）、安田雅昭、平井義彦

電気学会論文誌E 雑誌   Vol.128 ( No.8 )   325 - 330   2008.08

Sheath Voltage Estimation for Inductively Coupled Plasama Etcher by Impedance Analysis Reviewed

H. Kawata, M. Yasuda and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.8 )   6914 - 6916   2008.08

Analysis of Charging Phenomena of Polymer Films on Silicon Substrates under Electron Beam Irradiation Reviewed

M. Yasuda, K. Morimoto（学生）, Y. Kainuma（学生）, H. Kawata and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.6 )   4890 - 4892   2008.06

Cantilever Fabrication by Force-Free Release Transfer Reviewed

H. Kawata, K. Ryugou（学生）, S. Ohta（学生）, M. Yasuda and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.6 )   5248 - 5251   2008.06

Molecular Dynamics Study on Yield Stress of Si Mold for Nanoimprint Lithography Reviewed

K. Tada（学生）, M. Yasuda, Y. Kimoto, H. Kawata and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.47 ( No.4 )   2320 - 2323   2008.04

Molecular Dynamics Study of Electron-Irradiation Effects in Single-Walled Carbon Nanotubes Reviewed

M. Yasuda, Y. Kimoto, K. Tada, H. Mori, S. Akita, Y. Nakayama and Y. Hirai

Phys. Rev. B 雑誌   Vol.75 ( No.20 )   2007.05

Fabrication of Si Mold with Smooth Side Wall by New Plasma Etching Process Reviewed

H. Kawata, M. Yasuda and Y. Hirai

Microelectron. Eng 雑誌   Vol.84   1140 - 1143   2007.02

Si Etching with High Aspect Ratio and Smooth Side Profile for Mold Fabrication Reviewed

H. Kawata, M. Yasuda and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.45 ( No. 6B )   5597 - 5601   2006.06

Simple Method for Ion Current Measurement at RF Biased Electrode Reviewed

H. Kawata, M. Yasuda and Y. Hirai

Thin Solid Films 雑誌   Vol.506/507   683 - 687   2006.05

A Simulation of Energy-Filtered Backscattered Electron Signals from Subsurface Cu Interconnect Structures Reviewed

M. Yasuda, Y. Suzuki(学生), H. Kawata and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol.44 ( No. 7B )   5515 - 5519   2005.07

Ni Cantilever Fabrication by Transfer Process without Sacrificial Layer Reviewed

H. Kawata, M. Yasuda and Y. Hirai

Sensors and Materials 雑誌   Vol 16 ( No.4 )   211 - 222   2004.09

A Monte Carlo Calculation of Secondary Electron Emission from Organic Compounds Reviewed

M. Yasuda, T. Nobuo(学生) and H. Kawata

Jpn. J. Appl. Phys. 雑誌   Vol. 43 ( No. 6B )   4004 - 4008   2004.06

イメージリバーサルレジストを犠牲層とした付着の少ない表面マイクロマシン作製プロセス Reviewed

川田博昭, 安田雅昭

電気学会論文集E 雑誌   Vol.124 ( No.3 )   69 - 74   2004.03

New Fine Metal Pattern Fabrications by Transferal Process Reviewed

H. Kawata, T.Ueno(学生), M. Yasuda and Y. Hirai

Jpn. J. Appl. Phys. 雑誌   Vol. 42 ( No. 6B )   3854 - 3858   2003.06

Analysis of Backscattered Electron Signals in X-ray Mask Inspection Reviewed

M. Yasuda and H. Kawata

Jpn. J. Appl. Phys. 雑誌   Vol. 42 ( No. 6B )   3946 - 3949   2003.06

Monte Carlo Study of the Spin Polarization Enhancement in the Low Energy Secondary Electron Emission from Ferromagnetic Materials Reviewed

M. Yasuda, R. Katsuse(学生), H. Kawata and K. Murata

Surf. Interface Anal. 雑誌   Vol. 35 ( No.1 )   84 - 88   2003.01

Quantitative Electron Microprobe Analysis of Aluminum, Copper, and Gold Thin Films on Silicon Substrates Reviewed

M. Yasuda, S. Yamauchi, H. Kawata and K. Murata

J. Appl. Phys. 雑誌   Vol. 92 ( No.6 )   3403 - 3409   2002.09

A Monte Carlo Study of Magnetic Domain Images in a Spin-Polarized Scanninng Electron Microscope Reviewed

M. Yasuda, R. Katsuse(学生), H. Kawata and K. Murata

Jpn. J. Appl. Phys. 雑誌   Vol. 41 ( No.6B )   4246 - 4249   2002.06

Long Ni Cantilever Fabrication with New Sacrificial Process Reviewed

H. Kawata, J. Tabata(学生), T. Matsunaga(学生), M. Yasuda and K. Murata

Jpn. J. Appl. Phys. 雑誌   Vol. 41 ( No.6B )   4327 - 4331   2002.06

Performance Evaluation of the Multi-Stage Mott Polarimeter Using the Monte Carlo Simulation Reviewed

K. Tamura(学生), M. Yasuda, M. Kotera , and K. Murata

Rev. Sci. Instrum 雑誌   Vol.72 ( No.10 )   3921 - 3926   2001.10

A Monte Carlo Study of Spin-Polarized Electron Backscattering from Gold Thin Films Reviewed

M. Yasuda, K. Tamura(学生), H. Kawata, K. Murata , and M. Kotera

Nucl. Instrum. Meth. B 雑誌   Vol.183 ( No.3-4 )   196 - 202   2001.10

Monte Carlo Study of Backscattered Electron Signals from Microstructures of X-Ray Masks Reviewed

M. Yasuda, K. Fujii, H. Kawata, and K. Murata

Optik 雑誌   Vol.112 ( No.8 )   321 - 328   2001.08

Simulation of Spin-Polarized Secondary Electrons Reviewed

M. Yasuda, K. Tamura(学生), H. Kawata, and K. Murata

J. Phys. D : Appl. Phys. 雑誌   Vol.34 ( No.13 )   1955 - 1958   2001.07

スピン偏極二次電子のモンテカルロシミュレーション Reviewed

安田雅昭, 田村圭司(学生), 勝瀬龍平(学生), 川田博昭, 村田顕二

真空 雑誌   Vol. 44 ( No.3 )   256 - 259   2001.03

誘導結合型プラズマにおけるアンテナ電流とプラズマパラメータの関係 Reviewed

川田博昭, 彌永英倫(学生), 松永崇(学生), 安田雅昭, 村田顕二

真空 雑誌   Vol. 44 ( No.3 )   260 - 263   2001.03

Analysis of the Spin Polarization of Secondary Electrons Emitted from Au/Fe Reviewed

M. Yasuda, K. Tamura(学生), H. Kawata, K. Murata, T. Furukawa, and K. Koike

Appl. Surf. Sci. 雑誌   Vol.169/170 ( No.1-4 )   77 - 80   2001.01

Fabrication of a New Electrostatic Linear Actuator Reviewed

T. Matsunaga(学生), K. Kondoh, M. Kumagae(学生), H. Kawata, M. Yasuda, K. Murata, and M. Yoshitake

Jpn. J. Appl. Phys. 雑誌   Vol. 39 ( No.12B )   7115 - 7119   2000.12

GaAs/AlxGa1-xAs超格子の反射電子像の解析 Reviewed

安田雅昭, 宇根岳史(学生), 川田博昭, 村田顕二

真空 雑誌   Vol. 43 ( No.3 )   255 - 258   2000.03

スピン偏極走査電子顕微鏡における磁区コントラストの解析 Reviewed

田村圭司(学生), 安田雅昭, 村田顕二, 小寺正敏

真空 雑誌   Vol.43 ( No.3 )   259 - 262   2000.03

Analysis of the Spin Polarization of Secondary Electrons Emitted from Permalloy Polycristals Reviewed

K. Tamura(学生), M. Yasuda, K. Murata, K. Koike, and M. Kotera

Jpn. J. Appl. Phys. 雑誌   Vol. 38 ( No.12B )   7173 - 7175   1999.12

In Situ Measurements of the Resist Etch Rate for Submicron Patterns Reviewed

H. Kawata, H. Fukuda(学生), T. Matsunaga(学生), M. Yasuda, and K. Murata

Jpn. J. Appl. Phys. 雑誌   Vol. 38 ( No.7B )   4478 - 4482   1999.07

Mott検出器の高感度化に関する研究 Reviewed

田村圭司(学生), 安田雅昭, 村田顕二, 小寺正敏, 小池和幸

真空 雑誌   Vol.42 ( No.3 )   361 - 364   1999.03

A Simulation of Electron Scattering in Magnetic Materials Reviewed

K. Tamura(学生), M. Yasuda, K. Murata , and M. Kotera

Jpn. J. Appl. Phys. 雑誌   Vol. 37 ( No.12B )   7028 - 7031   1998.12

Power Measurements for Radio-Frequency Discharges with a Parallel-Plate-Type Reactor Reviewed

H. Kawata, T. Kubo(学生), M. Yasuda, and K. Murata

J. Electrochem. Soc. 雑誌   Vol.145 ( No.5 )   1701 - 1708   1998.05

Resist Etching with Parallel-Plate RF Plasmas Enhanced by a Cusp Magnetic Field Reviewed

H. Kawata, T. Kubo(学生), M. Yasuda, and K. Murata

Jpn. J. Appl. Phys. 雑誌   Vol.36 ( No.7B )   4879 - 4885   1997.07

Monte Carlo Simulation of Secondary Electron Emission from Thin Film/Substrate Targets Reviewed

K. Murata, M. Yasuda, and H. Kawata

Scanning Microsc. 雑誌   Vol.10 ( No.3 )   613 - 624   1996.09

The Spatial Distribution of Backscattered Electrons Calculated by a Simple Model Reviewed

M. Yasuda, H. Kawata ,and K. Murata

phys. stat. sol. (a) 雑誌   Vol.153 ( No.1 )   133 - 144   1996.01

Effects of the Introduction of the Discrete Energy Loss Process into Monte Carlo Simulation of Electron Scattering Reviewed

K. Murata, M. Yasuda ,and H. Kawata

Scanning 雑誌   Vol.17 ( No.4 )   228 - 234   1995.07

Study of the Spatial Distribution of Backscattered Electrons from a Gold Target with a New Monte Carlo Simulation Reviewed

M. Yasuda, H. Kawata , and K. Murata

J. Appl. Phys. 雑誌   Vol.77 ( No.9 )   4706 - 4713   1995.05

Effects of Heavy Atoms Added into a Resist on Energy Absorption in X-Ray Lithography Reviewed

K. Murata, M. Yasuda, H. Kawata, and T. Matsuda

J. Vac. Sci. Technol. B 雑誌   Vol.13 ( No.3 )   821 - 825   1995.05

Resist Heating Effect in Electron Beam Lithography Reviewed

M. Yasuda, H. Kawata, K. Murata, K. Hashimoto, Y. Hirai , and N. Nomura

J. Vac. Sci. Technol. B 雑誌   Vol.12 ( No.3 )   1362 - 1366   1994.05

The Spatial Distribution of Backscattered Electrons Revisited with a New Monte Carlo Simulation Reviewed

K. Murata, M. Yasuda , and H. Kawata

Scanning Microsc. 雑誌   Vol.6 ( No.4 )   943 - 954   1992.12

Smart process window proposal system for demanded conditions in nanoimprint assisted by deep learning International conference

Y. Kunitou, T. Tanaka, M. Yasuda, Y. Hirai

36th International Microprocesses and Nanotechnology Conference (MNC 2023)  2023.11  The Japan Society of Applied Physics

電子線リソグラフィにおけるネガ型レジストの現像初期過程の分子動力学解析 Domestic conference

田中琉暉、山田絵斗、安田雅昭

第84回応用物理学会秋季学術講演会  2023.09  応用物理学会

Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography Invited International conference

K. Yamada, Y. Hirai and M. Yasuda

The 40th International Conference of Photopolymer Science and Technology  2023.06  The Society of Photopolymer Science and Technology

Developing an endoscope lens with super water repellant antifouling function using biomimetics materials International conference

A. Sekiguchi, H. Minami, M. Yasuda and Y. Hirai

The 40th International Conference of Photopolymer Science and Technology  2023.06  The Society of Photopolymer Science and Technology

Application of Machine Learning to Nanoimprinting Processes and Materials Design International conference

Y. Hirai, Y. Kunitou and M. Yasuda

The 40th International Conference of Photopolymer Science and Technology  2023.06  The Society of Photopolymer Science and Technology

Simulation study on mechanical properties of SiO₂ nanorods under electron irradiation Domestic conference

T. Ito, J. Yamaguchi, M. Yasuda

2023.06 

Simulation analysis of backscattered electron signals for deformation of silicon crystals Domestic conference

J. Yamaguchi, T. Ito, M. Yasuda

2023.06 

電子線改質されたグラフェンのフォノン輸送の分子動力学解析（2） Domestic conference

吉田健二，植村拓, 安田雅昭

第70回応⽤物理学会春季学術講演会  2023.03 

化学増幅系レジストを対象とした電子線リソグラフィの確率論法-分子動力学法ハイブリットシミュレーション Domestic conference

中村大紀, 山田絵斗, 井上文太, 安田雅昭

第70回応⽤物理学会春季学術講演会  2023.03 

Molecular dynamics study of phonon density of states of electron-irradiated graphene International conference

K. Yoshida, T. Uemura, M. Yasuda

14th International Symposium on Atomic Level Characterizations for New Materials and Devices '22  2022.10 

Computational study of mechanical properties of SiO2 nanorods under electron irradiation International conference

T. Ito, J. Yamaguchi, M. Yasuda

14th International Symposium on Atomic Level Characterizations for New Materials and Devices '22  2022.10 

Fabrication of self-standing PMMA film with 0.5 μm throughholes by imprint and photolithography hybrid process International conference

H. Kawata, M. Yasuda, Y. Hirai, and H. Kikuta

The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

Study on smart process window design for thermal nanoimprint lithography using deep learning systems International conference

Y. Kunitou, R. Yamamura, K. Kameyama, M. Yasuda and Y. Hirai

The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

Compatibility of Thermal Property among in Nanoimprint Resin International conference

K. Kameyama, Y. Kunitou, H. Kawata, M. Yasuda and Y. Hirai

The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

Stochastic Simulation of Deactivation Effects in UV Curable Resin International conference

D. Nakamura, Y. Hirai, and M. Yasuda

The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

Computational study on the releasing process of slanted diffraction structure for AR glasses International conference

R. Yamamura, Y. Kunitou, K. Kameyama, M. Yasuda and Y. Hirai

The 22nd International Conference on Nanoimprint and Nanoprint Technology  2022.10 

確率論的シミュレーションと深層学習を用いた電子線リソグラフィのパターン形状の予測 Domestic conference

井上文太、平井義彦、安田雅昭

第71回高分子討論会  2022.09 

ディープラーニングを利用した熱ナノインプリントのプロセス設計 Domestic conference

國藤裕成、山村龍平、亀山開、安田雅昭、平井義彦

第83回応用物理学会秋季学術講演会  2022.09 

ディープラーニングのための熱ナノインプリント用樹脂の熱特性の検証 Domestic conference

亀山開、國藤裕成、川田博昭、安田雅昭、平井義彦

第83回応用物理学会秋季学術講演会  2022.09 

ネガ型レジストを対象とした電子線リソグラフィの分子動力学解析 Domestic conference

山田絵斗、平井義彦、安田雅昭

第83回応用物理学会秋季学術講演会  2022.09 

分子シミュレーションと深層学習による電子線リソグラフィのパターン形状予測システム Domestic conference

井上文太、平井義彦、安田雅昭

第83回応用物理学会秋季学術講演会  2022.09 

電子線改質されたグラフェンのフォノン輸送の分子動力学解析 Domestic conference

吉田健二、植村拓、安田雅昭

第83回応用物理学会秋季学術講演会  2022.09 

熱インプリントとフォトリソ併用による貫通孔付き自立樹脂薄膜の作製 Domestic conference

川田博昭、安田雅昭、平井義彦

第83回応用物理学会秋季学術講演会  2022.09 

電子と固体の相互作用の理論解析とその応用 Domestic conference

安田雅昭

2022年ナノ荷電粒子ビームに関する研究会  2022.08  応用物理学会 ナノ荷電粒子ビーム産学連携委員会

Stochastic simulation of pattern formation in EUV resists with photo-decomposable quenchers Invited International conference

K. Imai, B. Inoue, Y. Hirai, M. Yasuda

2022.06 

Process design for glycerol contained PVA based on hybrid deep learning system International conference

K. Kameyama, Y. Kunitou, H. Kawata, M. Yasuda, Y. Hirai

The 39th Int. Conf. of Photopolymer Science and Technology  2022.06 

Computational study of release process on tilted diffraction structure for AR glasses International conference

R. Yamamura, Y. Kunitou, M. Yasuda, Y. Hirai

The 39th Int. Conf. of Photopolymer Science and Technology  2022.06 

深層学習を用いた金属材料の二次電子収率の予測 Domestic conference

楠見将啓、平井義彦、安田雅昭

日本顕微鏡学会第78回学術講演会  2022.05 

スマートグラス用傾斜回折パターンの離型プロセス・材料に関する考察 Domestic conference

山村龍平，國藤裕成，亀山開，安田雅昭，平井義彦

第69回応用物理学会春季学術講演会  2022.03 

Study on Filling Process of Molecular Weight Dispersive Resin for Ultra fine Cavity International conference

K. Nakajima, M. Yasuda, Y. Miyashita, R. Yamamura, Y. Hirai

The 20th International Conference on Nanoimprint and Nanoprint Technologies  2021.11 

Smart process design using deep learning for thermal nanoimprint International conference

R. Yamamura, S. Tsukamoto, K. Kameyama, H. Tanabe, H. Kawata, M. Yasuda, Y. Hirai

The 20th International Conference on Nanoimprint and Nanoprint Technologies  2021.11 

Study of secondary electron emission based on deep learning systems International conference

M. Kusumi, Y. Hirai, and M. Yasuda

13th Int. Symp. on Atomic Level Characterizations for New Materials and Devices '21  2021.10 

Fabrication of self-standing thin films with small through-holes by imprint and photolithography hybrid process

H. Tanabe, H. Kawata, M. Yasuda, Y. Hirai, and H. Kikuta

2021 Int. Microprocesses and Nanotechnology Conf.  2021.10 

機械学習によるNILプロセス設計 Domestic conference

山村龍平，塚本創，亀山開，田邉英毅，川田博昭，安田雅昭，平井義彦

応用物理学会 ナノインプリント技術研究会  2021.10 

Si系材料添加における193nm液浸レジストの表面特性制御 Domestic conference

唐晨，関口淳，安田雅昭，平井義彦

第82回応用物理学会秋季学術講演会  2021.09 

低温熱ナノインプリントを用いた微細貫通孔付き自立樹脂薄膜の作製 Domestic conference

田邉英毅，川田博昭，安田雅昭，平井義彦

第82回応用物理学会秋季学術講演会  2021.09 

ディープラーニングを利用した二次電子放出の研究 Domestic conference

楠見将啓，平井義彦，安田雅昭

第82回応用物理学会秋季学術講演会  2021.09 

電子線改質したグラフェンの振動特性の分子動力学解析 Domestic conference

植村拓，平井義彦，安田雅昭

第82回応用物理学会秋季学術講演会  2021.09 

Smart design system for thermal nanoimprint process using hybrid deep learning International conference

R. Yamamura, S. Tsukamoto, K. Kameyama, H. Tanabe, H. Kawata, M. Yasuda, Y. Hirai

47th international conference on Micro and Nano Engineering  2021.09 

ハイブリッド・ニューラルネットワークを利用したナノインプリントプロセス ,材料のスマート設計 Domestic conference

塚本創，山村龍平，田邉英毅，亀山開，川田博昭，安田雅昭，平井義彦

応用物理学会 次世代リソグラフィ研究会 ワークショップ  2021.07 

Computational Study of Stochastic Effects in Extreme Ultraviolet Lithography Invited International conference

M. Yasuda, M. Koyama, K. Imai, M. Shirai, and Y. Hirai

38th Int. Conf. of Photopolymer Science and Technology  2021.06 

Stochastic Simulation of Development Process in Electron Beam Lithography International conference

B. Inoue, M. Koyama, A. Sekiguchi, M. Shirai, Y. Hirai, and M. Yasuda

38th Int. Conf. of Photopolymer Science and Technology  2021.06 

Fabrication of Thin Resin Film with Small Through Holes by Low Temperature Nanoimprint Process International conference

H. Kawata, S. Shimizu, H. Tanabe, M. Yasuda, H. Kikuta, and Y. Hirai

38th Int. Conf. of Photopolymer Science and Technology  2021.06 

Molecular Dynamics Study on the Filling Process of Molecular Weight Dispersive Resist into Nanoscale Cavities International conference

K. Nakajima, R. Yamamura, Y. Miyashita, M. Yasuda, and Y. Hirai

38th Int. Conf. of Photopolymer Science and Technology  2021.06 

Proposal of Hybrid Deep Learning Systems for Process and Material Design in Thermal Nanoimprint Lithography International conference

S. Tsukamoto, K. Kameyama, H. Tanabe, R. Yamamura, H. Kawata, M. Yasuda, and Y. Hirai

38th Int. Conf. of Photopolymer Science and Technology  2021.06 

Optimization of the Built-in Lens Mask for Three-Dimensional Photo Lithography International conference

T. Osumi, M. Sasago, M. Yasuda, and Y. Hirai

64th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication  2021.05 

Process and material design using hybrid machine learning for direct thermal nanoimprint International conference

S. Tsukamoto, R. Yamamura, H. Tanabe, K. Kameyama, H. Kawata, M. Yasuda, and Y. Hirai

64th Int. Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication  2021.05 

Automatic design of the build-in lens mask for three-dimensional photo lithography International conference

T. Osumi, M. Sasago, M. Yasuda, and Y. Hirai

Photomask Japan 2021  2021.04 

電子物理系特別演習（電子物性）

2024   Intensive lecture   Graduate school

電磁気学1A

2023   Weekly class   Undergraduate

電子物理系特別研究第1（電子物性）

2023   Intensive lecture   Graduate school

電子物理系特別演習第1（電子物性）

2023   Intensive lecture   Graduate school

気体エレクトロニクス

2023   Weekly class   Undergraduate

電子物理系特別演習（電子物性）

2023   Intensive lecture   Graduate school

電子物理系特別研究（電子物性）

2023   Intensive lecture   Graduate school

電子・イオンビーム工学特論

2023   Weekly class   Graduate school

電子物理系特別研究第2（電子物性）

2023   Intensive lecture   Graduate school

電子物理系特別演習第2（電子物性）

2023   Intensive lecture   Graduate school

気体エレクトロニクス

2022   Weekly class   Undergraduate

電磁気学IB

2022   Weekly class   Undergraduate

初年次ゼミナール

2022   Weekly class   Undergraduate

電子物理系特別演習（電子物性）

2022   Intensive lecture   Graduate school

電子物理系特別演習第1（電子物性）

2022   Intensive lecture   Graduate school

電子・イオンビーム工学特論 （中百舌鳥）

2022   Weekly class   Graduate school

電子物理系特別演習第2（電子物性） （中百舌鳥）

2022   Intensive lecture   Graduate school

電子物理系特別研究（電子物性）

2022   Intensive lecture   Graduate school

Advanced electron and ion beam technology

2021    

Gaseous Electronics

2021    

Electromagnetic Theory I B

2021